Symposium F4. Emerging Processing Technology - ALD
 

The scope of the symposium includes

1. System Design and Engineering:

  • ALD Precursors and Precursor Design
  • Precursor Delivery Systems Design 
  • Simulation, Modeling, and Theory of ALD
  • In-situ Monitoring and Analysis 
  • Plasma and Other Energy-Enhanced ALD Methods
  • Human computer interaction of ALD system
  • Equipment and Manufacturing

2. Chemistry, Processing and Characterization

  • ALD Surface Chemistry
  • Surface Preparation for ALD
  • Initiation stage of ALD Growth
  • Patterned and Selective Area ALD
  • Highly Conformal ALD Processes
  • Atomic layer Epitaxy and Doping
  • Characterization of ALD Coatings
  • Reliability of ALD Materials

3. Applications

  • ALD for Microelectronics
  • ALD for Nanotechnology
  • ALD for MEMS
  • ALD for Catalytic, Photovoltaic, Optical, and Magnetic Materials
  • Nano-laminate, Multi-component and Multi-layers Materials 
  • Devices Formed Using ALD Materials 
  • Novel Applications of ALD

Abstracts should be submitted electronically through website of IUMRS-ICA 2011, and questions and inquiries should be sent to the symposium organizers.

Dr. Chien-Nan Hsiao(蕭健男): cnhsiao@itrc.org.tw
Instrument Technology Research Center, National Applied Research Laboratories, Taiwan.
Prof. Miin-Jang Chen(陳敏璋): mjchen@ntu.edu.tw
Department of Materials Science and Engineering, National Taiwan University, Taiwan.
Prof. Feng-Yu Tsai(蔡豐羽): ftsai@ntu.edu.tw
Department of Materials Science and Engineering, National Taiwan University, Taiwan.

 

 

 

 
IUMRS-ICA 2011 12th International Conference in Asia 19-22 September, 2011
Taipei World Trade Center Nangang Exhibition Hall (TWTC Nangang)